This course introduces principles and practices of nanoengineered systems fabrication through a focused set of widely used methods. The course emphasizes bottom-up and field-assisted fabrication routes, with core coverage of carbon-based nanomaterials, semiconductor nanomaterials, and layered nanomaterials, as well as electrospinning of polymer nanofibers, self-assembly and layer-by-layer assembly for nanostructured coatings, electrochemical nanofabrication, including electrochemical atomic layer epitaxy, and thin-film deposition. Thin film deposition topics include physical vapor deposition methods such as thermal evaporation and electron beam evaporation, sputtering, and chemical vapor deposition methods, including low-pressure CVD, plasma-enhanced CVD, and atomic layer deposition, with an additional overview of epitaxial approaches such as metal organic CVD and molecular beam epitaxy. Students learn how to select fabrication routes based on targeted properties, materials compatibility, process constraints, and integration needs. Laboratory sessions provide hands-on experience aligned with the lecture content, including thin-film deposition by electron-beam evaporation and the interpretation of fabrication and characterization results.